Graphene-enabled block copolymer lithography transfer to arbitrary substrates

Abstract We describe a method for phase separating and transferring block copolymer (BCP) nanoscale patterns to arbitrary substrates surface-independent nanolithography. The enabling technology is hydrogenated or oxidized graphene thin film that only weakly adheres its substrate. BCPs are applied these graphene-based materials solvent annealed effect separation. Then, taking advantage of the weak interaction substrate, BCP/graphene stack delaminated easily in water. A target substrate then used retrieve stack, which can serve as lithographic mask. use water lift-off agent allows chemically mild retrieval phase-separated BCP, extending BCP lithography technique essentially substrates. demonstrate this graphene-enabled on silicon nitride polyethylene. also show using reduced oxide (RGO) enables transfer wafer-scale films SiO x Si. an RGO support produce solvent-annealed polystyrene, result not possible standard annealing shows utility technique. Finally, we ability create nanopatterns higher complexity by stacking multiple masks, capability conventional lithography. This may have applications fabricating nanoporous membranes photonically active coatings.